BIPV SUMMIT 2010 has been successful concluded on January 22nd, 2010 in Shanghai. The summit has brought together officials from China, Germany, the Netherlands, Spain, Switzerland, the United States, Canada, South Korea, Japan, Hong Kong and Taiwan, more than a dozen in the photovoltaic field of architecture which has a successful experience and advanced technology countries and regions. The two-day conference concerned about China's future development of integrated solar energy building. The core is to discuss the government policies for solar buildings; solar building technical barriers and solutions; and also concerned about the construction in China's PV market prospects for the future.

Following the world trend of development on low-carbon economy, solar photovoltaic building integration is undoubtedly a positive solution and the trend of development. But in the process of the China's development of BIPV at present is still encounter many problems, both in terms of policy-oriented, technology imports, or the market prospects. But by this summit, we can see the integration of BIPV a bright future.